Implementing Manufacturing science solutions to increase equiPment pROductiVity and fab pErformance

 
IMPROVE focused on 3 major development axes.
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• The development of Virtual Metrology (VM) techniques allowing the control of the process at wafer level whilst suppressing standard metrology steps.

• The development of Predictive Maintenance (PM) techniques to improve the process tools reliability whilst optimizing the maintenance frequency and increasing the equipment uptime.

• The development of Adaptive Control Plan (ACP) concepts, suppressing unnecessary measurements steps whilst dynamically improving the control plan efficiency.

For these 3 topics, models were developed and assessed for different process steps and equipment platforms in different manufacturing lines leading to the development of generic solutions.

The impact of the integration of the developed techniques in the various line decision systems and IT infrastructure was also evaluated and assessed.

To that end, a strong consortium of industrialists, SMEs, academia and institutes was made-up, including the major European actors in the area of semiconductor manufacturing.

The Final Summary of the project is available below.