Eniac-improve
Structure de mise en forme 2 colonnes
TitleMain authorOrganization short nameTitle of the periodical or the seriesYear
1Quality and exposure control in semiconductor manufacturing. Part I: ModellingBelgacem Bettayeb, MSc; Samuel Bassetto; Michel Tollenaere, PhD; Philippe VialletelleG-SCOP, STMicroelectronicsInternational Journal of Production Research2011
2Regression Methods for Virtual Metrology of Layer Thickness in Chemical Vapor DepositionH. Purwins, B. Barak, A. Nagi, R. Engel, U. Höckele, A. Kyek, S. Cherla, B. Lenz, G. Pfeifer, K. WeinzierlIFX, PMCIEEE/ASME Transactions on Mechatronics2012 / 2013
3Quality and exposure control in semiconductor manufacturing. Part II: EvaluationBelgacem Bettayeb, MSc; Samuel Bassetto; Michel Tollenaere, PhD; Philippe VialletelleG-SCOP, STMicroelectronicsInternational Journal of Production Research2011
4Optimisation of the process control in a semiconductor company: model and case study of defectivity samplingM. Shanoun, S. Bassetto, S. Bastoini & Ph. Vialletelle G-SCOP, STMicroelectronicsInternational Journal of Production Research2011
5Evaluation of Economic Effects as the Basis for Assessing Virtual Metrology InvestmentM. Koitzsch, A. HonoldIISB, InReConFuture Fab International, Issue 37, April 20112011
6A Novel Method for Monitoring Fluid Suspensions: Current Results and PerspectivesM.A.C. Potenza, T. Sanvito, A. Pullia, M. Giglio, D.Di Cola, D. LavalleUNIMI, TFFuture Fab International, Issue 39, October 20112011
7Developing a Framework for Virtual Metrology and Predictive MaintenanceM. Schellenberger, G. Roeder, A. Mattes, M. Pfeffer, L. Pfitzner, A. Knapp, H. Mühlberger, J.  Bichlmeier, C. Valeanu, A. Kyek, B. Lenz, M. Frisch, G. LeditzkyFhG-IISB, UAU, CamLine, IFX, AMSFuture Fab International, Issue 39, October 20112011
8Investitionsbewertung - Eine Methodik zur Bewertung und zum Vergleich von InvestitionenMerhof, J.; Michl, M.; Mainka, M.; Franke, J.FAPSIndustrie Management2012
9Predictive Sampling for Defect Density Control Operations M. Pfeffer, R. Oechsner, L. Pfitzner, S. Eckert, A. Hartmann, H. Gold, G. Biebl, J. KasparFhG-IISB, IFDD, IFAT, IFXFuture Fab International, Issue 42, July 20122012
10Virtual Metrology Models for Predicting Average PECVD Oxide Film Thickness A. Ferreira, D. Gleispach, A. Roussy, H. Gris, G. Hayderer, C. Kernaflen and J. Besnardaustriamicrosystems, EMSE-CMP, PDF Solutions22nd IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC), New York, USA, May 20112011
11A Smart Sampling Algorithm to Minimize Risk DynamicallyS. Dauzère-Pérès, JL. Rouveyrol, C. Yugma, P. VialletelleST-Microelectronics, EMSE-CMPASMC 2010, San Francisco, 21st Advanced Semiconductor Manufacturing Conference2010
12Predictive Maintenance supported by Advanced Process Control (APC) opens new equipment engineering and manufacturing opportunitiesStéphane Hubac 2 Frederic Duvi<//u><//u><//u>vier 3 Eric Zamai, 1,4  Aymen MiliST-Microelectronics, GSCOP,EMSE-CMPASMC 2010, San Francisco, 21st Advanced Semiconductor Manufacturing Conference2010
13Optimized design of control plans based on risk exposure and resources capabilitiesB. Bettayeb, P. Vialletelle, S. Bassetto, M. TollenaereG-SCOP, STMicroelectronicsISSM2010, Tokyo, 18th International Symposium on Semiconductor Manufacturing2010
14Optimizing Return On Inspection Trough Defectivity Smart SamplingM.Sahnoun, P. Vialletelle, S. Bassetto, S. Bastoini, M. TollenaereG-SCOP, STMicroelectronicsISSM2010, Tokyo, 18th International Symposium on Semiconductor Manufacturing2011
15Dynamic Management of Controls in Semiconductor
Manufacturing
Justin Nduhura Munga, Stéphane Dauzère-Pérès, Philippe Vialletelle, Claude YugmaEMSE-CMP, ST-Microelectronics22nd IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC), New York, USA, May 20112011
16A Predictive Maintenance System for Silicon Epitaxial DepositionGian Antonio Susto, Alessandro Beghi, Cristina De LucaUNIPD, IFAT7th IEEE Conference on Automation Science and Engineering (CASE)2011
17A Virtual Metrology System for Predicting CVD Thickness with Equipment Variables and Qualitative ClusteringGian Antonio Susto, Alessandro Beghi, Cristina De LucaUNIPD, IFAT16th IEEE International Conference on Emerging Technologies and Factory Automation (EFTA), Toulouse, 5-9 September 20112011
18Regression Methods for Prediction of PECVD Silicon Nitride Layer ThicknessH. Purwins, A. Nagi, B. Barak, U. Höckele, A. Kyek, B. Lenz, G. Pfeifer, K. WeinzierlIFX, PMC7th IEEE Conference on Automation Science and Engineering (CASE)2011
19Dependability of complex semiconductor systems Learning Bayesian Networks for decision supportM. F. Bouaziz, E. Zamaï, F Duvivier, S. HubacG-SCOP, Probayes & STMicroelectronicsProceedings of 3rd International Workshop on Dependable Control of Discrete Systems  (IEEE DCDS 2011), paper N°41, pp 09 – 14, Saarbrüken, Germany, june 15-17 2011.2011
20Towards Bayesian Network methodology to improve maintenance of complex semiconductor systemsM. F. Bouaziz, E. Zamaï, S. Monot, F. Duvivier, S. HubacG-SCOP, Probayes & STMicroelectronicsProceedings of 21st European Safety and Reliability Conference (ESREL 2011), Advances in Safety, Reliability and Risk Management – Bérenguer, Grall & Guedes Soares (eds) © 2012 Taylor & Francis Group, London, UK. ISBN 978-0-415-68379-1, Chapter N°16, pp 116 – 123, DOI: 10.1201/b11433-20, Troyes, France, September 18-22 2011.2012
21Equipment Health Factor prediction for complex semiconductor manufacturing facility M-F. Bouaziz, E. Zamaï,G-SCOPProceedings of 4th IFAC Symposium on Information Control Problems in Manufacturing (IFAC INCOM 2012), paper N°377, pp 98 – 103, ISSN: 1474-6670; ISBN: 978-3-902661-98-2, DOI: 10.3182/20120523-3-RO-2023.00377, Bucharest, Romania, May 23-25 2012.2012
22A Mathematical Programming Approach for Determining Control Plans in Semiconductor ManufacturingJustin NDUHURA MUNGA, Stéphane DAUZERE-PERES, Claude YUGMA, Philippe VIALLETELLEEMSE-CMP, ST-MicroelectronicsIESM 2011 - International Conference on Industrial Engineering and Systems Management, May 25 - 27, 2011
Metz- France
2011
23Modélisation de l'état de santé d'un équipement de fabrication par une méthode probabilisteM-F. Bouaziz, E. Zamaï, S, Hubac, G-SCOP & STMicroelectronicsProceedings of 9th International Conference on Modeling, Optimization & SIMulation (MOSIM 2012), paper N°141, 10p, Bordeaux, France, June 06-08 2012.2012
24Impact of Control Plan Design on Tool Risk Management: A Simulation Study in Semiconductor ManufacturingG.L. Rodriguez Verjan, S. Dauzère-Pérès, J. PinatonEMSE-CMP, ST-MicroelectronicsProceedings of the 2011 Winter Simulation Conference2011
25Implementing Virtual Metrology into Semiconductor Production Processes – An Investment AssessmentM. Koitzsch, J. Merhof, M. Michl, H. Noll, A. Nemecek, A. Honold, G. Kleineidam, H. LebrechtFhG-IISB, FAPS, IFAT, Inrecon, FH WNProceedings of the 2011 Winter Simulation Conference2011
26Framework for Integration of Virtual Metrology and Predictive MaintenanceG. Roeder, A. Mattes, M. Pfeffer, M. Schellenberger, L. Pfitzner, A. Knapp, H. Mühlberger, A. Kyek, B. Lenz, M. Frisch, J. Bichlmeier, G. Leditzky, E.Lind, S. Zoia, G. FazioFhG-IISB, UAU, IFX, CamLine, AMS, Micron23rd IEEE / SEMI Advanced Semiconductor Manufacturing Conference (ASMC)2012
27Multilevel Kernel Methods for Virtual Metrology in Semiconductor ManufacturingA. Schirru, S. Pampuri, C. Di Luca, G. De NicolaoIFAT, UNIPV18th IFAC World Congress, Milano, Italy, August 28 - September 2, 20112011
28Multilevel Lasso Applied to Virtual Metrology in Semiconductor ManufacturingS. Pampuri, A. Schirru, G. Fazio, G. De NicolaoUNIPV, Micron7th IEEE Conference on Automation Science and Engineering (CASE)2011
29Proportional Hazard Model with L1 Penalization Applied to Predictive Maintenance in Semiconductor ManufacturingS. Pampuri, A. Schirru,C. De Luca, G. De NicolaoUNIPV, IFAT7th IEEE Conference on Automation Science and Engineering (CASE)2011
30Dynamic Maintenance in Semiconductor Manufacturing using Bayesian NetworksD. Kurz, J. Kaspar, J. PilzIFAT, University Klagenfurt7th IEEE Conference on Automation Science and Engineering (CASE)2011
31Optimized Management of Excursion in Semiconductor ManufacturingJ. Nduhura Munga, S. Dauzère-Pérès, P. Vialletelle, C. YugmaEMSE-CMP, STMicroelectronicsProceedings of the 2011 Winter Simulation Conference2011
32A Smart Sampling Scheduling and Skipping Simulator and it Evaluation on Real Data SetsC. Yugma, S. Dauzère-Pérès, J.L. Rouveyrol, P. Vialletelle, J. Pinaton, C. RelliaudEMSE-CMP, STMicroelectronicsProceedings of the 2011 Winter Simulation Conference2011
33Information Technology Used for Process Control System Implementation in IMPROVEG. Fazio, F. Crippa, S. Zoia, A. Kyek, C. Valeanu, M. Ghiga, J. BichlmeierNumonyx, IFX, CamLine11th European Advanced Equipment Control / Advanced Process Control Conference2011
34Data mining and machine learning technique in semiconductor manufacturing processes (PECVD)B. LenzIFXISMI Manufacturing Week (Symposium on Manufacturing Effectiveness)2011
35DES within semiconductor manufacturing Merhof, J.; Lebrecht, H.; Michl, M.; Franke, J.FAPS, IFATISMI Manufacturing Week (Symposium on Manufacturing Effectiveness)2011
36Predictive Sampling approach to dynamically optimize defect density control operations M. Pfeffer, R. Oechsner, L. Pfitzner, S. Eckert, A. Hartmann, H. Gold, G. Biebl, J. KasparFhG-IISB, IFDD, IFAT, IFX23rd IEEE / SEMI Advanced Semiconductor Manufacturing Conference (ASMC)2012
37Predictive Maintenance Modeling of an IHC Implanter Ion Source Utilizing Bayesian NetworksU. Schöpka, A. Mattes, R. Öchsner, L. Pfitzner, B. Barak, A. Kyek, B. LenzFhG-IISB, IFXProceedings of the 2012 Winter Simulation Conference2012
38Data Mining and Support Vector Regression Machine Learning in Semiconductor Manufacturing to improve Virtual MetrologyB. Lenz, B. Barak, T. Kunstmann, F. Bachl, U. Höckele, S. Jank, R. EngelIFX, IFDDHawaiian International Conference of System Science (HICSS-46)2013
39Bayesian Networks for maintenance planning in ion implantationU. Schöpka, B. Barak, A. Mattes, A. Kyek, R. Öchsner, B. Lenz, L. Pfitzner FhG-IISB, IFXISSM2012, Tokyo
20th International Symposium on Semiconductor Manufacturing
2012
40Optimal Tuning of Epitaxy PyrometersG.A. Susto, S. Pampuri, A. Schirru, A. BeghiUNIPD, UNIPV23rd IEEE / SEMI Advanced Semiconductor Manufacturing Conference (ASMC)2012
41A Predictive Maintenance System based on Regularization Methods for Ion-ImplantationG.A. Susto, A. Schirru, S. Pampuri, A. BeghiUNIPD, UNIPV23rd IEEE / SEMI Advanced Semiconductor Manufacturing Conference (ASMC)2012
42An Information-Theory and Virtual Metrology-based approach to Run-to-Run Semiconductor Manufacturing ControlG.A. Susto, A. Schirru, S. Pampuri, G. De nicolao, A. BeghiUNIPD, UNIPV8th IEEE Conference on Automation Science and Engineering (CASE)2012
43Multistep Virtual Metrology Approaches for Semiconductor Manufacturing ProcessesS. Pampuri, A. Schirru, G.A. Susto, G. De nicolao, A. Beghi, C. De lucaUNIPD, UNIPV, IFAT8th IEEE Conference on Automation Science and Engineering (CASE)2012
44Least Angle Regression for Semiconductor Manufacturing ModelingG.A. Susto, A. BeghiUNIPDIEEE Multi-Conference on Systems and Control, 20122012
45 A Predictive Maintenance System for Epitaxy Processes based on Filtering and Prediction TechniquesG.A. Susto, A. Beghi, C. De LucaUNIPD, IFATIEEE Transactions on Semiconductor Manufacturing2012
46IMPROVE Simulation Tool – Integrating heterogeneous simulation modules for semiconductor manufacturing processesN. Almeida, J. Pires, D. SoraCMF23rd IEEE / SEMI Advanced Semiconductor Manufacturing Conference (ASMC)2012
47A numerical method for the efficient atomistic simulation of the plasma-etch
of nano-patterned structures
L. Chiaramonte, R. Colombo G. Fazio, A. La MagnaCNR-IMM, Micron Computational Material Science2012
48Atomic scale simulations in the dry etching plasma processes L. Chiaramonte, R. Colombo G. Fazio, A. La MagnaCNR-IMM, MicronMicro & Nano Engineering Congerence Proceedings 2010
49Smart Sampling for Risk reduction and Delay OptimisationM. Sahnoun, B. Bettayeb, M. Tollenaere, S. Bassetto, G-SCOP,IEEE International Systems Conference, SYSCON 20122012
50Virtual Metrology Modeling for CVD Film ThicknessJ. Besnard, D. Gleispach, H. Gris, A. Ferreira, A. Roussy, C. Kernaflen and G. Hayderer,austriamicrosystems, EMSE-CMP, PDF SolutionsInternational Journal of Control Science and Engineering2012
51Nonparametric Virtual Sensors for Semiconductor Manufacturing

A. Schirru, S. Pampuri, C. De Luca, G. De NicolaoIFAT, UNI PVInternational Conference on Informatics in Control, Automation and Robotics (ICINCO) 20112011
52Virtual Sensors for semiconudctor manufadcturing, a nonparametric approachA. Schirru, S. Pampuri, C. De Luca, G. De NicolaoIFAT, UNI PVLecture Notes on Electrical Engineering (LNEE)2012
53Efficient FDC based on hierarchical tool condition monitoring schemeJ. Blue, A. Roussy, A. Thieullen, J. PinatonEMSE-CMP, STMicroelectronics23rd IEEE / SEMI Advanced Semiconductor Manufacturing Conference (ASMC)2011
54A Survey of Health Indicators and Data-Driven Prognosis in Semiconductor Manufacturing ProcessA. Thieullen, M. Ouladsine, J. PinatonLSIS - STMicroelectronics8th IFAC Symposium on Fault Detection, Supervision and Safety of Technical Processes. Mexico City, Mexico, August 20122012
55Dispatching of lots to Dynamically Reduce the Wafer at Risk in Semiconductor ManufacturingG. L. Rodriguez-Verjan, Eric Tartiere, Jacques Pinaton, S. Dauzère-Pérès, and A. ThieullenEMSE-CMP, STMicroelectronics8th IEEE Conference on Automation Science and Engineering (CASE)2012
56A Mathematical model for estimating defectivity capacity with a dynamic control strategy.G.L. Rodriguez-Verjan, S. Dauzère-Pérès, J. PinatonEMSE-CMP, STMicroelectronicsProceedings of the 2012 Winter Simulation Conference2012
57Evaluation of economic effects as the basis for assessing the investment into Virtual MetrologyM. Koitzsch, A. HonoldIISB, InReConISMI Manufacturing Week AEC/APC Symposium, Austin - USA, 20102010
58‘Virtual Metrology’ on Plasma Tools – Test Cases and End User Perspectives Mick Tiernan, Niall Mac Gearailt, Ger Ennis, Karl Brennan.IntelARCSIS2010 13th Technical + Scientific Meeting on ' Manufacturing Challenges in European Semiconductor Fabs). 2010
59A novel approach to minimize the number of controls in Defectivity areaJ. Nduhura,  C. Yugma, S. Dauzère‐Pérès, P. VialletelleEMSE-CMP, ST-MicroelectronicsARCSIS2010 13th Technical + Scientific Meeting on ' Manufacturing Challenges in European Semiconductor Fabs). 2010
60An approach for operational risk evaluation and its link to control planB. Bettayeb, P. Vialletelle, S. Bassetto, M. TollenaereG-SCOP, STMicroelectronicsARCSIS2010 13th Technical + Scientific Meeting on ' Manufacturing Challenges in European Semiconductor Fabs). 2010
61Computation of Wafer-At-Risk from Theory to Real Life DemonstrationM.Sahnoun, P. Vialletelle, S. Bassetto, S. Bastoini, M. TollenaereG-SCOP, STMicroelectronicsARCSIS2010 13th Technical + Scientific Meeting on ' Manufacturing Challenges in European Semiconductor Fabs). 2010
62Estimating CVD Thickness through Statistical InferenceMethodsGian Antonio Susto, Alessandro Beghi, Cristina De LucaUNIPD, IFATIntel European Research & Innovation Conference 2010 (ERIC)2010
63A Predictive Maintenance System for Epitaxy ProcessGian Antonio Susto, Alessandro Beghi, Cristina De Luca, Michael Holzinger, Martin HuberUNIPD, IFATIntel European Research & Innovation Conference 2010 (ERIC)2010
64A Statistical Approach for Maintenance Management in Semiconductor ManufacturingGian Antonio Susto, Alessandro Beghi, Cristina De LucaUNIPD, IFATStatistical methods applied in microelectronics, Catholic University of Milan2011
65Comparison of Bayesian Networks and Tree Ensembles for Prediction of Implanter Filament BreakdownP. Scheibelhofer, U. Schöpka, G-Leditzkyaustriamicrosystems, FraunhoferStatistical methods applied in microelectronics, Catholic University of Milan2011
66Optimisation des contrôles dans la fabrication des
semi-conducteurs
Justin Nduhura-Munga, Stéphane Dauzère-Pérès, Claude Yugma, Philippe VialletelleEMSE-CMP, ST-MicroelectronicsROADEF, Angers, France, April 11-13 2012 
67Using DES for ROI calculations within semiconductor manufacturingJ. Merhof, H. Lebrecht, M. Michl, M. Koitzsch, J. FrankeFAPS, IFAT, FhG-IISBAEC/APC Symposium Asia2011
68Approaches for Implementation of Virtual Metrology and Predictive Maintenance into Existing Fab SystemsG. Roeder, M. Schellenberger, U. Schoepka, M. Pfeffer, S. Winzer, S. Jank, D. Gleispach, G. Hayderer, L. PfitznerFraunhofer IISBStatistical methods applied in microelectronics, Catholic University of Milan2011
69How to “IMPROVE” collaboration in (huge) research projectsM. Schellenberger, G. Roeder, M. Pfeffer Intel European Research & Innovation Conference 2011 (ERIC)2011
70Plasma Measurement for Virtual Metrology & ControlS. Daniels, B. Keville, J. Whelan, Y. Zang, E. Guidemenko, S. Keychar C Hayden Statistical methods applied in microelectronics, Catholic University of Milan2011
71Feature scale simulation in the chain of tools for the simulation of plasma processA. La Magna, G. Fazio, F. Garrozzo, B. Helmer, B. Keville, A. MarchelliCNR-IMM, Micron, Lam, Dublin University Statistical methods applied in microelectronics, Catholic University of Milan2011
72The plasma SheathB. Keville Statistical methods applied in microelectronics, Catholic University of Milan2011
73Considerations on algorithm's for Virtual Metrology implementationG. Roeder, S. Winzer Statistical methods applied in microelectronics, Catholic University of Milan2011
74Learning methods applied to Virtual Metrology in semiconductor manufacturingS. Pampuri Statistical methods applied in microelectronics, Catholic University of Milan2011
75Estimation of prediction accuracy with random tree ensembles based on PVD Film ThicknessG. Leditzky, U. Scheibelhoferaustriamicrosystems AG, Graz University of TechnologyStatistical methods applied in microelectronics, Catholic University of Milan2011
76Filters and wrappers methods: towards an enhanced variable selection for virtual metrology; DEMO: Matlab prototype for statistical Virtual Metrology ModelsA. Ferreira Statistical methods applied in microelectronics, Catholic University of Milan2011
77Species cross contamination control trough FDCN. Di Stefano Intel European Research & Innovation Conference 2011 (ERIC)2011
78Virtual Equipment, a test bench for Virtual MetrologyA. Mattes Intel European Research & Innovation Conference 2011 (ERIC)2011
79Impact of sampling on Wafer-at-Risk and Metro time delayM. Sahnoun, B. Bettayeb, P. Vialletelle, A. Mili, M. TollenaereG-SCOP
STMicroelectronics
Intel European Research & Innovation Conference 2011 (ERIC)2011
80Electrical Probes for Plasma DiagnosticsF. Martinez Process Diagnostics Workshop, Oct. 14th 2011, Dublin City University2011
81OES Capabilities for Plasma AnalysisN. MacgearailtIntelProcess Diagnostics Workshop, Oct. 14th 2011, Dublin City University2011
82Phased resolved OESS. DanielsDCUProcess Diagnostics Workshop, Oct. 14th 2011, Dublin City University2011
83Applications of Process Diagnostics in HVMM. CarberyLAM ResearchProcess Diagnostics Workshop, Oct. 14th 2011, Dublin City University2011
84Statistical approaches to virtual metrology and predictive maintenance: experience from IMPROVE ProjectG. De NicolaoUNIPVStatistical methods applied in microelectronics, Catholic University of Milan2011
85Proportional Hazard Model with L1 Penalization applied to Predictive Maintenance in Semiconductor ManufacturingS. Pampuri, A. Schirru,C. De Luca, G. De NicolaoUNIPV, IFATStatistical methods applied in microelectronics, Catholic University of Milan2011
86Random tree ensembles for Predictive Maintenance of filament breakdown on an implanterP. Scheibelhofer, G. Leditzky, M. Berger, P. Schröttner, D. Gleispach and G. HayederAustriaMicroSystems, Graz University of technologyStatistical methods applied in microelectronics, Catholic University of Milan2011
87Proportional Hazard Model with L1 Penalization Applied to Predictive Maintenance in Semiconductor ManufacturingS. Pampuri, A. Schirru,C. De Luca, G. De NicolaoUNIPV, IFATIntel European Research & Innovation Conference 2011 (ERIC)2011
88Decision making based on the EHF integration in a complex semiconductor manufacturingM-F. Bouaziz, M. Sahnoun, E. Zamaï, S. Hubac,G-SCOP, STMicroelectronics12th European Advanced Process Control and Manufacturing (APCM) Conference2012
89Predictive Maintenance Emerging Trend and OpportunitiesG. LeditzkyAustriaMicroSystemsIntel European Research & Innovation Conference 2011 (ERIC)2011
90European Fabs competitiveness: if agility is the answer, then collaboration is the way!P. Vialletelle, F. Finck, S. Dauzère-PérèsSTMicroelectronics, EMSE-CMP12th European Advanced Process Control and Manufacturing (APCM) Conference2012
91Dispatching and Dynamic Sampling Strategy to Reduce Wafer at Risk on Tools in a 200mm FabEric Tartiere, Gloria Luz Rodriguez-Verjan,
Jacques Pinaton, Stephane Dauzere-Peres,
Alexis Thieullen
STMicroelectronics, EMSE-CMP12th European Advanced Process Control and Manufacturing (APCM) Conference2012
92Dynamic defective model for semiconductor production plantsC. Berenato, B. Monaco, C. Mola, D. Vinciguerra, M. Inzirillo, M. Capuana, S. Sau, M. Longheu, D. PaganoST Italy12th European Advanced Process Control and Manufacturing (APCM) Conference2012
93Information Technology used for Process Control System implementation in IMPROVEF. Crippa, S. Zoia, A. Kyek, C. Valeanu, M. Ghiga, J. BichlmeierMicron, IFX, CamLine12th European Advanced Process Control and Manufacturing (APCM) Conference2012
94Integration of the IMPROVE framework at Infineon Technologies AGB. LenzIFX12th European Advanced Process Control and Manufacturing (APCM) Conference2012
95Atomic Scale Simulations of Plasma Etching Process A. La Magna, L. Chiaramonte, R. Colmbo G. FazioCNR-IMM, MicronFall Meeting of the European Material Science Society2010
96Role of the Atomistic Simulations in the virtual metrology of plasma processes A. La Magna, L. Chiaramonte, R. Colmbo G. FazioCNR-IMM, Micron10th European Advanced Equipment Control / Advanced Process Control2010
97Analysis of Risks and Related Damages due to the Implementation of Virtual Metrology Algorithms into Semiconductor Fabrication LinesM. Koitzsch, A. Honold, H. Noll, A. NemecekFhG-IISB, InReCon, FHWNAPC Conference XXIV, 20122012
98IMPROVE – A joint European effort to boost efficiency in semiconductor manufacturingM. Schellenberger, M. Koitzsch, G. Roeder, M. Pfeffer, U. Schöpka, A. Mattes, L. PfitznerFhG-IISBAPC Conference XXIV, 20122012
99Stability and quality of virtual metrology models for on-line prediction of CVD film thicknessD. Gleispach, G. Hayderer, P. Scheibelhofer, H. Gris and J. Besnardaustriamicrosystems, PDF Solutions12th European Advanced Process Control and Manufacturing (APCM) Conference2012